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Magic Denuded Zone® (MDZ®) is a patented, rapid method of achieving reproducible and reliable internal gettering in silicon wafers. It is a Rapid Thermal Process (RTP) based technique in which the oxygen precipitation behavior is controlled by the manipulation of vacancy rather than oxygen concentration profiles. MEMC has engineered the RTP process to create a vacancy concentration depth profile that effectively preprograms the precipitate-free zone depth and precipitate density of the wafer to ideal targets. MDZ® produces a silicon wafer with ideal oxygen precipitation behavior, and reproducible and reliable IG which is nearly independent of the initial oxygen concentration, the thermal history effects from crystal growth, and the IC fab process application.
Magic Denuded Zone®, MDZ®, and the MDZ® logo are registered trademarks of MEMC Electronic Materials, Inc. All rights reserved.
The MDZ® process is protected by the following patents:5,994,761; 6,180,220; 6,204,152; 6,306,733; 6,586,068; 6,849,119; 6,336,968; 6,432,197; 6,709,511; 6,191,010; 6,579,779; 6,713,370
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